Zewnętrzne identyfikatory
| WoS ResearcherID | BRAK |
| ORCID | BRAK |
| Scopus ID | BRAK |
Historia zatrudnienia
| Belarusian State Pedagogical University Minsk | zatrudniony do dnia dzisiejszego |
Trzy ostatnio wprowadzone artykuły autora (3)
Composition of Co films/Si substrate systems prepared by means of self-ion assisted deposition and accompanying silicon damage / Igor Tashlykov, Paweł Żukowski, Oleg Mikhalkovich, Yuri Ermakov, Vladimir Chernysh // Przegląd Elektrotechniczny.- 2010, vol. 86, nr 7, s. 122-124
Analysis of the composition of Ti-based thin films deposited on silicon by means of self-ion assisted deposition / I. S. Tashlykov, P. V. Zukowski, S. M. Baraishuk, O. M. Mikhalkovich // Radiation Effects and Defects in Solids : Incorporating Plasma Science and Plasma Technology.- 2007, vol. 162, nr 9, s. 637-641
Analysis of composition, morphology and wettability of Mo thin layers deposited on glass / Igor Tashlykov, Paweł Żukowski, Oleg M. Mikhalkovich // Przegląd Elektrotechniczny.- 2016, vol. 92, nr 11, s. 229-231 [MNiSW: 14]
Trzy ostatnio wprowadzone fragmenty książek autora (2)
Analysis of composition, morphology and wettability of Mo thin layers deposited on glass / Igor Tashlykov, Oleg M. Mikhalkovich, Paweł Żukowski. [W]: 9th International Conference "New Electrical and Electronic Technologies and their Industrial Implementation", NEET 2015, Zakopane, Poland, June 23 – 26, 2015 : [book of abstrcts].- 2015, s. 43-43
Surface properties of Me/Si structures prepared by means of self-ion assisted deposition / Igor Tashlykov, Paweł Żukowski, Sergei M. Baraishuk, Oleg M. Mikhalkovich. [W]: 8th International Conference "New Electrical and Electronic Technologies and their Industrial Implementation"NEET 2013, Zakopane, Poland, June 18-21, 2013 :[book of abstrcts].- 2013, s. 73-73
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