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The optical-electronic system for measuring of geometrical parameters of micrometrical objects is a difficult process that requires the observance of certain features designing or improvement. The observance of that will provide a higher measurement accuracy compared with the accuracy metrics of measurement that were developed without compliance with these design features. Every feature of the design reduces the error of the functioning of individual nodes of the system or errors in nodes under the influence of various internal or external factors. When reducing or eliminating each factor of occurrence of the error, respectively, will increase the overall measurement accuracy. In this work, the result of introducing measurement error for each factor is determined experimentally and proved the correctness of such actions.
Experimental researches of the measurement error to the stage of compliance with subtleties in the improvement of the opto-electronic system was 10 +/- 1.5 mu m, and after improvement with considering of the specifics of the design measurement error of geometrical parameters was 10 +/- 0,33 mu m.
