Zgadzam się
Nasza strona zapisuje niewielkie pliki tekstowe, nazywane ciasteczkami (ang. cookies) na Twoim urządzeniu w celu lepszego dostosowania treści oraz dla celów statystycznych. Możesz wyłączyć możliwość ich zapisu, zmieniając ustawienia Twojej przeglądarki. Korzystanie z naszej strony bez zmiany ustawień oznacza zgodę na przechowywanie cookies w Twoim urządzeniu.
9th International Conference ELMECO-9 " Electromagnetic Devices and Processes in Environment Protection " with 12th Seminar AoS-12 "Applications of Superconductors"
The aim of this article is to present the results of research aimed at confirmation whether it is possible to form so-called intermediate band in silicon band gap region by means of implantation of neon ions. Obtained results were discussed with particular emphasis on possible applications in photovoltaic industry. As it is commonly known, the idea of intermediate band solar cells reveals considerable potential as the most fundamental principle of next generation of silicon solar cells. This is because the efficiency of solar cells with intermediate band is supposed to exceed current theoretical limits, which were defined for older generations of solar cells. In progress of the research, series of antimony-doped silicon samples were subjected to implantation of Ne ions, followed by high-temperature annealing. Experiment included different values of fluence of implanted ions, as well as different post-implant annealing temperatures. Tests were conducted using thermal admittance spectroscopy, under conditions of variable ambient temperature, measuring signal frequency and bias voltage in order to localize deep energy levels, introduced by ion implantation. In case of certain samples, it was possible to observe evidence indicating on the possibility of occurrence the phenomena of band gap narrowing and energy levels splitting
