Structure and Properties of Tantalum Coatings Obtained by Electron Beam Technology on Aluminum Substrates
Artykuł w czasopiśmie
MNiSW
100
Lista 2021
| Status: | |
| Autorzy: | Ananiashvili Khatia, Okrosashvili Mikheil, Loladze Tamar, Valko Natalia, Kołtunowicz Tomasz |
| Dyscypliny: | |
| Aby zobaczyć szczegóły należy się zalogować. | |
| Rok wydania: | 2020 |
| Wersja dokumentu: | Drukowana | Elektroniczna |
| Język: | angielski |
| Numer czasopisma: | 11 |
| Wolumen/Tom: | 10 |
| Numer artykułu: | 3737 |
| Strony: | 1 - 8 |
| Impact Factor: | 2,679 |
| Web of Science® Times Cited: | 0 |
| Scopus® Cytowania: | 0 |
| Bazy: | Web of Science | Scopus |
| Efekt badań statutowych | NIE |
| Finansowanie: | This research was funded by Shota Rustaveli National Science Foundation of Georgia (SRNSFG) – PHDF-18-736 “Development of the Technology for Obtaining Functional Coatings on the Special Substrate” and by the Polish Ministry of Science and Higher Education as a Science Fund of the Lublin University of Technology, at the Faculty of Electrical Engineering and Computer Science FN-28/E/EE/2019 “Researches of electrical, magnetic, thermal and mechanical properties of modern electrotechnical and electronic materials, including nanomaterials and diagnostic of electrical devices and their components”. |
| Materiał konferencyjny: | NIE |
| Publikacja OA: | TAK |
| Licencja: | |
| Sposób udostępnienia: | Witryna wydawcy |
| Wersja tekstu: | Ostateczna wersja opublikowana |
| Czas opublikowania: | W momencie opublikowania |
| Data opublikowania w OA: | 28 maja 2020 |
| Abstrakty: | angielski |
| The paper deals with the study of the structure and properties of tantalum coatings formed by electron beam evaporation and deposition of tantalum powder on 300–450 °C aluminum substrate. The research results of surface morphology, phase and elemental composition show that high activity of an aluminum substrate and specific conditions for vapor-phase technology promote formation of tantalum coatings characterized by a high degree of crystalline grains, with high adhesion and hardness despite the surface cracks. It was observed that the optimum deposition temperature of tantalum on aluminum substrates varies from 300 °C to 350 °C. These coatings demonstrate excellent physical and mechanical properties due to formation of intermetallic phases in the reactive zone. |
