Structure and mechanical properties of Nb−Al−N nanocomposite films as a function of the deposition parameters
Artykuł w czasopiśmie
| Status: | |
| Autorzy: | Ivashchenko Volodymyr I., Rogoz Vladyslav M., Skrynskiy Pavlo L., Kozak Czesław, Opielak Marek |
| Rok wydania: | 2015 |
| Wersja dokumentu: | Drukowana | Elektroniczna |
| Język: | angielski |
| Numer czasopisma: | 2 |
| Wolumen/Tom: | 19 |
| Strony: | 179 - 187 |
| Scopus® Cytowania: | 5 |
| Bazy: | Scopus |
| Efekt badań statutowych | NIE |
| Materiał konferencyjny: | NIE |
| Publikacja OA: | NIE |
| Abstrakty: | angielski |
| Nb−Al−N films were deposited by magnetron sputtering of Nb and Al in an atmosphere of Ar−N2 onto silicon wafers, at different currents of magnetron power supply, on which an aluminum (IAl) target is mounted. The films were studied by X-ray diffractometry, nano- and microindentation. The size of nanocrystals, microstrain, nanohardness, and the elastic modulus are extremely dependent on IAl. The films exhibit nanohardness and Knoop hardness in the range 29−33.5 GPa and 46−48 GPa, respectively |
