Zgadzam się
Nasza strona zapisuje niewielkie pliki tekstowe, nazywane ciasteczkami (ang. cookies) na Twoim urządzeniu w celu lepszego dostosowania treści oraz dla celów statystycznych. Możesz wyłączyć możliwość ich zapisu, zmieniając ustawienia Twojej przeglądarki. Korzystanie z naszej strony bez zmiany ustawień oznacza zgodę na przechowywanie cookies w Twoim urządzeniu.
New classes of high-entropy alloys, which consist of at least 5 main elements with atomic concentrations 5–35 at.%, are under great interest in modern material science. It is also very important to explore the limits of resistance of high-entropy alloy nitrides to implantation by high-energy atoms. Structure and properties of nanostructured multicomponent (TiHfZrNbVTa)N coatings were investigated before and after ion implantation. We used the Rutherford backscattering, scanning electron microscopy with energy dispersive X-ray spectroscopy, highresolution transmission electron microscopy and scanning transmission electron microscopy with local microanalysis, X-ray diffraction and nanoindentation for investigations. Due to the high-fluence ion implantation (N+, the fluence was1018cm−2) a multiphase structure was formed in the surface layer of the coating. This structure consisted of amorphous, nanocrystalline and initial nanostructured phases with small sizes of nanograins. Two phases were formed in the depth of the coating: fcc and hcp (with a small volume fraction). Nitrogen concentration reached 90 at.% near the surface and decreased with the depth. Nanohardness of the as-deposited coatings varied from 27 to 34 GPa depending on the deposition conditions. However, hardness decreased to a value of 12 GPa of the depth of the projected range after ion implantation and increased to 23 GPa for deeper layers.
